The equipment room of the gas-phase deposition furnace is a vertical structure, and the door of the gas-phase deposition furnace adopts screw lifting or hydraulic lifting/manual lifting. The double-layer furnace shell structure has an inner layer of stainless steel and an outer layer of carbon steel, with water cooling in the middle. The graphite carbon rod heating body and the graphite carbon felt insulation layer have good insulation effect. The control method is PLC and touch screen, with manual and automatic control switching. The automation level is high and the operation is convenient. The main electrical components are made of Zhizhi Famous brand, stable and reliable performance. Equipped with discharge and loading trucks for easy operation and loading, improving work efficiency
The pressure, gas flow rate, and chip temperature of the reaction chamber in the vapor deposition furnace all play a role in the variation range of deposition parameters. Therefore, considering the variables in the deposition film and the deposition rate determining the output of the reaction chamber, the film generated by the reaction will not only deposit on the chip, but also on other components of the reaction chamber. Therefore, the degree of thorough cleaning of the reaction chamber is also important
