Nowadays, many university laboratories and research institutes are using vapor deposition furnaces. Compared with other deposition methods, vapor deposition furnaces not only have the advantages of simple equipment operation, convenient maintenance, and strong flexibility, but also have a series of advantages:
(1) At moderate to high temperatures, the vapor deposition furnace deposits solids through gas-phase chemical reactions between gaseous initial compounds;
(2) The vapor deposition furnace can be used for deposition at atmospheric pressure (atmospheric pressure) or below, and generally speaking, low pressure is more effective;
(3) The use of plasma and laser assisted techniques in vapor deposition furnaces can significantly promote chemical reactions, allowing deposition to occur at lower temperatures;
(4) The chemical composition of the coating can be altered to obtain gradient deposits or mixed coatings;
(5) Can control the density and purity of the coating;
(6) Good coating properties, capable of depositing on complex shaped substrates and granular materials;
(7) Gas conditions are usually laminar and can form a thick boundary layer on the surface of the substrate;
(8) The sedimentary layer usually has a columnar crystal structure and is not resistant to bending, but by various techniques for gas-phase perturbation of chemical reactions, fine grain equiaxed sedimentary layers can be obtained;
(9) Gas deposition furnaces can form coatings of various metals, alloys, ceramics, and compounds. As long as the raw gas is slightly changed and different process parameters are used, sedimentary layers with different properties can be prepared; Can coat various complex shaped workpieces, such as those with grooves, grooves, holes, or blind holes; Strong adhesion between coating and substrate.
