Design of Vapor Deposition Furnace

time：2021/12/2 17:02:00 来源：http://cn.sinokiln.com/news968446.html

Vapor deposition furnace is a traditional technology for preparing thin films. Its principle is to use gaseous precursor reactants to form thin films on the wafer through chemical reactions between atoms and molecules. Vapor deposition can produce materials with high quality, purity, and strength, making it very popular in the semiconductor industry

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Design of Vapor Deposition Furnace

CVD vapor deposition furnace