The function of a vapor deposition furnace is to react in the gas phase at high temperatures, such as the thermal decomposition of metal halides, organic metals, hydrocarbons, etc., hydrogen reduction, or the method of causing its mixture of gases to undergo chemical reactions at high temperatures to precipitate inorganic materials such as metals, oxides, carbides, etc. This technology was initially developed as a means of coating, but currently, it is not only applied to coatings of heat-resistant substances, but also to high-purity materials The refinement of metals, powder synthesis, semiconductor thin films, and other fields of technology are quite distinctive
The technical characteristics of a vapor deposition furnace are: (1) high melting point substances can be synthesized at low temperatures; (2) The forms of precipitates are various, including single crystals, polycrystals, whiskers, powders, thin films, etc; (3) It can not only be coated on the substrate, but also on the surface of the powder. Especially at low temperatures, it is possible to synthesize high melting point substances, which has made contributions to energy conservation. As a new technology, it has great prospects
