The vapor deposition furnace is an equipment developed and produced by our company for many years. The vapor deposition furnace refers to the gas phase reaction at high temperatures, such as the thermal decomposition of metal halides, organic metals, hydrocarbons, etc., hydrogen reduction, or the method of causing its mixture of gases to undergo chemical reactions at high temperatures to precipitate inorganic materials such as metals, oxides, carbides, etc. This technology was originally developed as a coating method, but currently, it is not It is a characteristic technical field that only applies to coatings of heat-resistant substances, and is also used for refining high-purity metals, powder synthesis, semiconductor thin films, etc
The technical characteristics of the gas-phase deposition furnace sold by Xianyang Ceramic Research Institute are: (1) high melting point substances can be synthesized at low temperatures; (2) The forms of precipitates are various, including single crystals, polycrystals, whiskers, powders, thin films, etc; (3) It can not only be coated on the substrate, but also on the surface of the powder. Especially at low temperatures, high melting point materials can be synthesized, and CVD vapor deposition furnaces have made contributions to energy conservation, making them a promising new technology
