Keyuan Gas Deposition Furnace has mature technology, complete models, reliable quality, and guaranteed services. It is a long-term cooperative enterprise of major universities and scientific research institutions, and can be customized according to needs. Below, we will learn about the technical characteristics of gas deposition furnaces.
1) At medium or high temperatures, solid substances are formed by gas phase chemical reactions between initial compounds in the gas phase to deposit on the substrate.
2) Gas deposition furnaces can be Under normal pressure or vacuum conditions (negative pressure is used for deposition, and usually the quality of the vacuum deposited film layer is good)
3) The use of plasma and laser assisted technology can significantly promote chemical reactions, allowing deposition to occur at lower temperatures The chemical composition of the coating can vary with changes in gas phase composition, resulting in gradient deposits or mixed coatings The vapor deposition furnace can control the density and purity of the coating6) Wrap the plated parts well. It can be coated on complex shaped substrates and granular materials. Suitable for coating various complex shaped workpieces. Due to its good coating performance, it can be applied to workpieces with grooves, grooves, holes, and even blind holes
The sedimentary layer usually has a columnar crystal structure and is not resistant to bending, but various techniques can be used to perturb the chemical reaction in gas phase to improve its structure The vapor deposition furnace can form various metal, alloy, ceramic, and compound coatings through various reactions
