A vapor deposition furnace is a high-temperature sintering equipment that utilizes medium frequency induction heating. Chemical Vapor Deposition (CVD), also known as Chemical Vapor Deposition, refers to the gas-phase reaction at high temperatures, such as the thermal decomposition of metal halides, organic metals, hydrocarbons, etc., hydrogen reduction, or the method of causing its mixture of gases to undergo chemical reactions at high temperatures to precipitate inorganic materials such as metals, oxides, carbides, etc. This technology was originally developed as a Developed as a means of coating, it is currently not only applied to coatings of heat-resistant substances, but also to the refinement of high-purity metals, powder synthesis, semiconductor thin films, etc., which is a distinctive technical field
The technical features of a vapor deposition furnace are: (1) high melting point substances can be synthesized at low temperatures; (2) The forms of precipitates are various, including single crystals, polycrystals, whiskers, powders, thin films, etc; (3) It can not only be coated on the substrate, but also on the surface of the powder. Especially at low temperatures, high melting point substances can be synthesized, which has made contributions to energy conservation and has great prospects as a new technology
