Chemical vapor deposition furnaces can be used for the chemical vapor deposition of composite materials using hydrocarbon gases as carbon sources. Among them, CVD vapor deposition furnaces refer to gas phase reactions at high temperatures, such as the thermal decomposition of metal halides, organic metals, hydrocarbons, etc., hydrogen reduction, or the method of causing its mixture of gases to undergo chemical reactions at high temperatures to precipitate inorganic materials such as metals, oxides, carbides, etc. This technology began as a Developed as a means of coating, it is currently not only applied to coatings of heat-resistant substances, but also to the refinement of high-purity metals, powder synthesis, semiconductor thin films, etc., which is a distinctive technical field
The equipment characteristics of CVD vapor deposition furnace are: (1) synthesizing high melting point substances at low temperatures; (2) The forms of precipitates are various, including single crystals, polycrystals, whiskers, powders, thin films, etc; (3) Not only can it be coated on the substrate, but it can also be coated on the surface of the powder, especially at low temperatures where high melting point substances can be synthesized, making a contribution to energy conservation. As a new technology, it has great prospects
